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Extreme ultraviolet lithography
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Extreme ultraviolet lithography
RIS
0.001
(Research Intensity Score)
Papers
190
Top papers
Extreme ultraviolet lithography
2024 · 121 citations
Single Rare-Earth Ion Doped Tin-Oxo Nanocluster Photoresists for High-Resolution Extreme Ultraviolet Lithography
2025 · 36 citations
Wavelength-multiplexed multi-mode EUV reflection ptychography based on automatic differentiation
2024 · 45 citations
Sub‐10‐nm Lithography for Sn4–Oxo Clusters: Effect of Molecular Polarity on Sensitivity and Resolution
2025 · 25 citations
Amorphous Carbon Films for Electronic Applications
2022 · 88 citations
Polytelluoxane as the ideal formulation for EUV photoresist
2025 · 16 citations
Recent Advances in Metal-Oxide-Based Photoresists for EUV Lithography
2024 · 26 citations
Synthesis and Characterizations of a Nonalkyl Tin Oxo Cluster and its Application as High EUV Absorption Coefficient and Etch Resistant Inorganic Resist for EUV Lithography
2025 · 16 citations
Tin‐Oxo Nanocluster Composite Films as Positive‐Tone Photoresist for Extreme UV Lithography
2025 · 13 citations
Newest papers
Quantum Stark widths of EUV lines in Ge XXIX ion of fusion interest
2026 · 1 citations
Aromatic organic-tin hybrid films as electron beam resists
2026 · 2 citations
Depth profiling chemical changes in chemically amplified resists for EUV lithography
2026
Adaptive Tunneling Lithography with Field-Controlled Sub-Nanometer Resolution: Architecture, Characteristics, and Fabrication Pathway(revised version)
2026
Adaptive Tunneling Lithography with Field-Controlled Sub-Nanometer Resolution: Architecture, Characteristics, and Fabrication Pathway(revised version)
2026
Tert‐Butyl–Engineered Trinuclear Tin Complexes for High‐Sensitivity Sub‐10 Nm Patterning
2026 · 2 citations
A Point-spread Function for the Extreme Ultraviolet High-resolution Imager on Board Solar Orbiter
2026
Active Control of Extreme Ultraviolet Photon Flux and Resolution with a Plane Ruled Reflection Grating Spectrometer that Measures Diverging High-Harmonics
2026
High Contrast EUV Imaging Enabled by Topological Quasi Phase-Only Masks
2026
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