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Remote plasma
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Remote plasma
RIS
0.001
(Research Intensity Score)
Papers
188
Top papers
ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
2022 · 55 citations
Epitaxial growth of high-quality GaN with a high growth rate at low temperatures by radical-enhanced metalorganic chemical vapor deposition
2024 · 18 citations
Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films Using Ultralow Electron Temperature Plasma
2025 · 10 citations
Deposition of HfO2 by Remote Plasma ALD for High-Aspect-Ratio Trench Capacitors in DRAM
2025 · 8 citations
Highly Selective Isotropic Etching of Si to SiGe Using CF4/O2/N2 Plasma for Advanced GAA Nanosheet Transistor
2025 · 5 citations
An Optically Enhanced Crystalline Silicon Allotrope: Hydrogen Passivated Type II Silicon Clathrate
2026 · 3 citations
Interface-Engineered, Low-Damage IGZO/HfO2 Charge-Trapping Memory Devices Fabricated Using a Remote Plasma ALD Process
2026 · 1 citations
Enhanced Luminous Transmission and Solar Modulation in Thermochromic VO 2 Aerogel-like Films via Remote Plasma Deposition
2025 · 4 citations
Effective Suppression of Amorphous Ga 2 O and Related Deep Levels on the GaN Surface by High-Temperature Remote Plasma Pretreatments in GaN-Based Metal–Insulator–Semiconductor Electronic Devices
2023 · 26 citations
Newest papers
An Optically Enhanced Crystalline Silicon Allotrope: Hydrogen Passivated Type II Silicon Clathrate
2026 · 3 citations
Interface-Engineered, Low-Damage IGZO/HfO2 Charge-Trapping Memory Devices Fabricated Using a Remote Plasma ALD Process
2026 · 1 citations
Feature Comparison and Process Optimization of Multiple Dry Etching Techniques Applied in Inner Spacer Cavity Formation of GAA NSFET
2026 · 2 citations
Surface Modification of Polystyrene Substrates <i>via</i> Non-thermal Atmospheric Pressure Plasma Treatment for Controlling Cell Adhesion
2026
Polycrystalline ferroelectric croconic acid for multisource environmental energy harvesting
2026
Plasma-Enhanced Atomic Layer Deposition of Metallic Tantalum Protective Coatings for PEMWE Bipolar Plates
2026
Cyclic Etching of SiGe/Si Multilayers with Fluorine Chemistry for 3D DRAM Applications
2026
Femtosecond TALIF and Optical Emission Calibration for Quantifying N-Atom Production in RF Plasma Sources
2026
NF3 plasma-enhanced isotropic atomic layer etching of amorphous and crystalline hafnium oxide films
2026
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