Plasma Etching, Ion Sources, and Electric Propulsion
This community investigates the physics of gas discharges to fabricate micro-scale structures and generate thrust for spacecraft. The work focuses on controlling ion and electron behavior in argon, xenon, and other gases to achieve precise material removal and efficient propulsion.
The research centers on inductively and capacitively coupled plasmas, with significant emphasis on atomic layer etching and reactive ion etching of silicon and silicon carbide. A substantial portion of the work addresses Hall thrusters and ion thrusters for electric propulsion, including studies on alternative propellants and ion source design. The community also examines dusty plasmas, optical emission spectroscopy, and the fundamental characteristics of gas discharges, often using simulation and magnetic field configurations to model plasma parameters and electron emission.
The community represents a significant share of research in noble gases, accounting for 8.4% of all neon research, 7.4% of argon research, and 7.0% of xenon research. These elements are central to the plasma processes studied, serving as both working gases for etching and propellants for thrusters.
The community comprises 44,526 papers, publishing most frequently in the Journal of Applied Physics, The Journal of Chemical Physics, and Plasma Sources Science and Technology.
Recent work continues to focus on the mechanisms of etching silicon nitride and oxide films in fluorine-based plasmas, the development of high-aspect-ratio silicon nanopillars, and the design of compact plasma thrusters and ion sources for fusion and space applications.